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AIPLA 2021 Spring Meeting
May 10 to 14, 2021
Location
Virtual
Credits
coming soon
Registration
Fee: Various Member and Non-Member Rates
Registration closes May 14, 2021 at 12:00 AM
Register Now
We're looking for a great week of learning, sharing, and connecting. We are bringing together a diverse, global community of law firms, companies, and institutions involved in the practice of patent, trademark, copyright, trade secret, and other unfair competition laws at AIPLA's 2021 Virtual Spring Meeting. Scheduled from Monday, May 10 to Friday, May 14, the Spring Meeting has topics of interest to a wide range of IP practice. And don't worry, we'll be back in Seattle for the 2023 Spring Meeting.
View the SCHEDULE AT A GLANCE
Topics and sessions include:- Filing Requirements with Inventors in Multiple Countries
- An Update on Special Programsfrom the USPTO
- Patent Prosecution: PCT, Ex Parte Appeals, and Overcoming Obviousness
- Copyright and Music Sampling,
- Trademark Application Best Practices
- The Intersection Between Patent Prosecution and Patent Litigation
- IP Lessons of the Pandemic and Leading Your Team and Litigating Cases in a Post Covid-19 World
- IP in the Supreme Court: A Review of Recent Decisions
- Design Patent Litigation in District Courts
- Interplay between District Court and PTAB Litigation
- ETHICS: Cannabis and the Law
- Who Decides Role of Judges and Juries in IP Cases
- Patent Pools in the Age of IoTs, 5G and NextGen Video Codecs: The Impact of FTC v. Qualcomm
- Copyright and Fan Fiction Cosplay
- Recent Impact of Supreme Court Trademark Decisions, and the USPTO’s Use of Failure-to-Function and Ornamentation Refusal
- ETHICS: Civility, Professionalism and Mental Health in Difficult Times
- Trade Secret: Using Patents, Trademarks, and Copyright to Preserve and Protect Trade Secrets and Balancing Privacy and Protection
- Biotechnology and Chemical Arts Patent Law Update
- Corporate Practice: Remote Notary Services, IP Protection in a Work-From-Home World, IP and Distressed Companies, and Data,Data Everywhere
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