IPP Israel/ Professionalism & Ethics Joint CLE Oct. 19, 2017 - Thank you!

Announcement Description

Thank you to all who were able to join us for our joint committee CLE program at AIPLA's Annual Meeting in D.C.  We had an audience of well over 100 people and enjoyed an interesting and lively discussion of ethical guidelines and potential pitfalls for patent attorneys and agents who practice in Israel, China, Japan, and Europe.  Special thanks to Penny Prater for moderating the discussion and to Joel Beider, Erik Dokter, Aki Ryuka, and Tom Moga for serving as panelists.​




Created at 10/31/2017 11:18 AM by Rivka Jungreis
Last modified at 10/31/2017 11:18 AM by Rivka Jungreis