2014 Practical Patent Prosecution Training for New Lawyers
Who Should Attend:
This two-day seminar, also referred to as “boot camp,” is tailored for new practitioners (i.e., those having less than two years of experience), or others who want to learn the basics of patent application preparation and prosecution. This comprehensive CLE-accredited seminar includes instructional sessions and hands-on claim drafting workshops taught by skilled and experienced private and corporate practitioners. United States Patent & Trademark Office representatives are also invited. The program will conclude with a choice of one of three hands-on claim drafting workshops in these areas:
CNA has approved a 5% premium discount for the August 7-8, 2014 Practical Patent Prosecution Training for New Lawyers Boot Camp.
We are an approved provider by most states requiring CLE and have applied for credit for this meeting to all states requiring CLE. The number of credit hours will vary depending on the requirements of the individual state. For 50-minute states, up to 18.9 CLE credit hours, including 1.2 Ethics hours are available. Certificates of Attendance, Attendance Sign-in Rosters and all other CLE information for states with CLE requirements will be available at the Registration Desk. The Practical Patent Prosecution Training for New Lawyers seminar has been approved for Minimum Continuing Legal Education credit by the State Bar of California (a 60-minute state) in the amount of 15.75 credit hours, including 1.0 Ethics hour. AIPLA certifies that this activity conforms to the standards for approved education activities prescribed by the rules and regulations of the State Bar of California governing minimum continuing legal education.*
*Disclaimer: AIPLA is a nonprofit national bar association. The sole purpose of this CLE program is to provide educational and informational content. AIPLA does not provide legal services or advice. The opinions, views and other statements expressed by contributors to this CLE program are solely those of the contributors. These opinions, views and statements of the contributors do not necessarily represent those of AIPLA and should not be construed as such.